| 摘要 |
The present disclosure relates to an exposure apparatus exposing a wafer to light by guiding the light. The exposure apparatus comprises: a light source device emitting light; a wafer stage allowing a wafer to be placed thereon; and a light guide system having a light input unit receiving light from the light source device, and guiding light to irradiate the light to the wafer. The light source device includes: a first light source module including a first substrate and at least one semiconductor light emitting device provided on the first substrate, and emitting light toward the light input unit; and a second light source module including a second substrate and at least one semiconductor light emitting device provided on the second substrate, and emitting light toward the light input unit. |
