PLASMA GENERATION APPARATUS

摘要

The present invention provides a plasma generation apparatus. The plasma generation apparatus includes: a radio frequency (RF) power supply; an inner antenna connected to the RF power supply and receiving power; an outer antenna connected to the RF power supply to receive power and disposed at the outer circumference to enclose the inner antenna; and an inner grounding ring electrically connected to the inner antenna and disposed between the inner antenna and the outer antenna. The plasma generation apparatus can change a structure of a grounding unit to control the flow of RF currents.