| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method excellent in exposure latitude (EL) and performance of preventing development defects. <P>SOLUTION: The pattern forming method includes: forming a film by using an active ray-sensitive or radiation-sensitive resin composition containing (A) a resin whose solubility with an alkali developing solution is increased by the action of an acid and (B) a compound that generates an acid having a moiety structure expressed by general formula (LD) by irradiation with active rays or radiation; exposing the film; and developing the exposed film by using an aqueous solution of tetramethylammonium hydroxide having a concentration of less than 2.38 mass%. <P>COPYRIGHT: (C)2011,JPO&INPIT |
