| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition having excellent sensitivity while maintaining storage stability in a level suitable for practical use, and in particular, to provide a positive resist composition for electron beams, X-rays or EUV light, and a resist film formed of the composition and a pattern forming method using the composition. <P>SOLUTION: The active ray-sensitive or radiation-sensitive resin composition contains a resin (P) having a repeating unit expressed by general formula (I). In the formula, R<SB>1</SB>, R<SB>2</SB>and R<SB>3</SB>each independently represent a hydrogen atom, alkyl group, cycloalkyl group, halogen atom, cyano group or alkoxycarbonyl group; L<SB>1</SB>represents a single bond or a divalent linking group; L<SB>2</SB>represents an alkylene group or an arylene group having an electron withdrawing groups; and Ar represents an aromatic group, wherein L<SB>1</SB>or L<SB>2</SB>may be bonded to R<SB>3</SB>to form a five- or six-membered ring. <P>COPYRIGHT: (C)2011,JPO&INPIT |
