METHOD FOR PREPARING OF CERIUM OXIDE POWDER FOR CHEMICAL MECHANICAL POLISHING AND METHOD FOR PREPARING OF CHEMICAL MECHANICAL POLISHING SLURRY USING THE SAME

摘要

A method for preparing cerium oxide powder for chemical mechanical polishing(CMP) slurry is provided to obtain CMP slurry capable of increasing the chemical contact area between a polishing agent and a layer to be polished, reducing the time required for polishing, and preventing scratches on a layer to be polished. A method for preparing cerium oxide powder for CMP slurry comprises the steps of: (a) providing a cerium precursor; (b) decomposing the cerium precursor; and (c) firing the decomposed cerium precursor. In step (a), the cerium precursor includes carbonate, hydroxide, chloride, oxalate or sulfate. When providing the cerium precursor in step (a), a urea or ammonium carbonate is optionally added as an additive. The decomposed cerium precursor is optionally dispersed and pulverized before step (c).