发明名称 LIQUID FOR LIQUID IMMERSION EXPOSURE AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a liquid for a liquid immersion having a high transmission factor at 193.4 nm, hard to deteriorate due to an exposure, and excellent in the reusability of the liquid. <P>SOLUTION: The liquid for the liquid immersion exposure is used for a device and a method of liquid immersion exposure for exposure through the liquid filled between a projection optical system and a lens substrate. The liquid comprises a trans-decahydronaphthalene with a content of a cis-decahydronaphthalene less than 0.05 mass%. The trans-decahydronaphthalene is the liquid refined by a precision refining, and further refined by a concentrated sulfric acid. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008098334(A) 申请公布日期 2008.04.24
申请号 JP20060277238 申请日期 2006.10.11
申请人 JSR CORP 发明人 FURUKAWA TAIICHI;YAMADA KINJI;MIYAMATSU TAKASHI
分类号 H01L21/027;G03F7/38 主分类号 H01L21/027
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