| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an extreme ultraviolet light source device for exposure with a relatively high output, capable of suppressing generation of debris as much as possible without resorting to processing of the once-generated debris. <P>SOLUTION: The extreme ultraviolet light source device is provided with a chamber for generating extreme ultraviolet light, a target supplying means for supplying solid tin or lithium as a target in a predetermined position in the chamber, a CO<SB>2</SB>laser for generating plasma to the target supplied by the target supplying means by irradiating a laser beam by pulse operation, and a collector mirror having a multi-layer film on a reflection surface, collecting and emitting the extreme ultraviolet light radiated from the plasma. <P>COPYRIGHT: (C)2008,JPO&INPIT |
