| 摘要 |
With respect to an assembly which is provided with a supporting substrate (1), an optical material layer (2), a mask material layer and a first resin layer, a design pattern is transferred to the first resin layer by an imprint method using a mold that is provided with the design pattern that corresponds to a fine pattern. A mask pattern layer (18) is formed by patterning the mask material layer. Subsequently, a second resin layer (21), which covers a mask part (32) of the mask pattern layer (18), said mask part (32) corresponding to a transfer region B, and does not cover a non-mask part (33) other than the mask part, is formed. After that, a protective layer (22) that covers the mask part (32) is provided and the mask part (32) is exposed by removing the second resin layer (21) by a lift-off method, and an optical element layer having the fine pattern is formed by etching the optical material layer (2) with use of the mask part (32). |
