Lithographic apparatus and method for calibrating a stage position
摘要
<p>A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50x the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.</p>
申请公布号
EP2131243(A2)
申请公布日期
2009.12.09
申请号
EP20090161522
申请日期
2009.05.29
申请人
ASML NETHERLANDS B.V.
发明人
AARTS, IGOR;GEERKE, JOHAN;VAN DER PASCH, ENGELBERTUS;DE JONG, FREDERIK;VAN DE GRIFT, MARC