| 发明名称 |
INTEGRATED PHOTODETECTOR WAVEGUIDE STRUCTURE WITH ALIGNMENT TOLERANCE |
| 摘要 |
An encapsulated integrated photodetector waveguide structures with alignment tolerance and methods of manufacture are disclosed. The method includes forming a waveguide structure bounded by one or more shallow trench isolation (STI) structure(s). The method further includes forming a photodetector fully landed on the waveguide structure. |
| 申请公布号 |
US2016260849(A1) |
申请公布日期 |
2016.09.08 |
| 申请号 |
US201615155462 |
申请日期 |
2016.05.16 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
Assefa Solomon;Porth Bruce W.;Shank Steven M. |
| 分类号 |
H01L31/0232;H01L29/06;G06F17/50;G02B6/136;H01L31/028;H01L31/0304;G02B6/122;G02B6/42;H01L31/0203;H01L31/18 |
主分类号 |
H01L31/0232 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A sensor structure, comprising:
a waveguide structure bounded by one or more shallow trench isolation (STI) structures; and a photodetector fully landed on the waveguide structure, adjacent to the one or more STI structures. |
| 地址 |
Armonk NY US |
