发明名称 HETERO STRUCTURE TYPE FIELD EFFECT TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To provide a hetero structure type field effect transistor having excellent various type characteristics, excellent long term stability and high reliability. SOLUTION: A Schottky junction forming layer (2) and a carrier supply layer (3) are constituted of different materials conforming their operations, respectively. Thus, good gate characteristics and the long term stability as an FET are allowed to be compatible.
申请公布号 JP2001326346(A) 申请公布日期 2001.11.22
申请号 JP20000142648 申请日期 2000.05.16
申请人 NIPPON TELEGR & TELEPH CORP <NTT>;NTT ADVANCED TECHNOLOGY CORP 发明人 SUEMITSU TETSUYA;FUSHIMI HIROSHI;YOKOYAMA HARUKI
分类号 H01L29/201;H01L21/338;H01L29/778;H01L29/812;(IPC1-7):H01L29/778 主分类号 H01L29/201
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