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发明名称
PROCESS FOR FORMING FLUOROSILICATE GLASS LAYERS USING HIGH DENSITY PLASMA, FOR COPPER DAMASCENE INTEGRATED CIRCUIT
摘要
申请公布号
KR20010098585(A)
申请公布日期
2001.11.08
申请号
KR1020010019846
申请日期
2001.04.13
申请人
发明人
分类号
主分类号
代理机构
代理人
主权项
地址
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