| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.
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| 申请公布号 |
US2005170296(A1) |
申请公布日期 |
2005.08.04 |
| 申请号 |
US20040766526 |
申请日期 |
2004.01.29 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JANSEN ALBERT JOHANNES M.;KUIT JAN J.;LOOPSTRA ERIK R.;SCHRIJVER RAYMOND LAURENTIUS J. |
| 分类号 |
H01L21/027;G03F7/00;G03F7/20;(IPC1-7):G03F7/00 |
主分类号 |
H01L21/027 |
| 代理机构 |
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