| 摘要 |
An apparatus and a method for aligning a mask are provided to prevent thermal damage to a device due to irradiating laser at the other area except a glass frit by preventing the slide of a mask. An apparatus for aligning a mask includes a body(210), a transferring unit(230), a substrate stage(240), and a mask absorbing unit(260). The transferring unit(230) is installed on the body(210), and brings in/out a substrate by rotating and moving up/down. The substrate stage(240) is installed on the transferring unit(230), and fixes and supports the substrate. The mask absorbing unit(260) is installed at the edge of the upper surface of the substrate stage(240), and absorbs the mask. |
