LIQUID CRYSTAL PHOTOMASK FOR EXPOSURE APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD

摘要

Provided are a liquid crystal photomask for an exposure apparatus, which has excellent light transmission efficiency and light blocking efficiency, and an exposure apparatus and an exposure method using such liquid crystal photomask. A liquid crystal photomask (1) for the exposure apparatus is provided with one or more liquid crystal shutters (7) which selectively transmit and block light emitted from an exposure light source (11). The liquid crystal shutter (7) is provided with a pair of transparent electrodes (2, 3) and a light control layer (4) arranged between the transparent electrodes (2, 3). The light control layer (4) includes a bar-like compound having an extremely long absorption wavelength within a range of 200-450nm, and a bar-like liquid crystal compound. Preferably, the light control layer further contains a polymeric compound.