| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a reflective mask capable of reducing an influence degree of phase defects.SOLUTION: Provided is a method of manufacturing a reflective mask comprising a substrate, a multilayer film formed on the substrate, and an absorber pattern formed on the multilayer film. The substrate is a glass substrate having Si-O coupling. The multilayer film is formed on the substrate. The method of manufacturing a reflective mask includes: a preparation step of preparing a mask blank having information on phase defects; a phase defect correction step of concentrating and emitting short pulse laser light from the substrate side to the substrate in the region where the phase defects exist on the basis of the information on the phase defects and information on the absorber pattern to move positions of the phase defects; and an absorber pattern formation step of forming the absorber pattern on the multilayer film so that at least the phase defects whose positions are moved at the phase defect correction step are covered with the absorber pattern. |
