发明名称 INSPECTING AND MEASURING METHOD BASED ON CHANGED PARTICLE BEAM IMAGE, DEVICE FOR THE METHOD, AND CHARGED PARTICLE BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an inspecting and measuring method and device using a charged particle beam capable of keeping a condition with less charge-up and obtaining an electron beam image of stable image quality. SOLUTION: Ultraviolet radiating systems 31 and 30 are controlled by a radiation control means 32, and scanning with a charged particle beam is controlled by a scan control means 18. The radiation control means 32 and the scan control means 18 are controlled by an overall control device 8 so that they are synchronized, and signals from an electron sensor 14 are turned into image by an image takeout part 27 and an image processing circuit 28, and inspection and length measuring of the specimen are conducted.
申请公布号 JP2000357483(A) 申请公布日期 2000.12.26
申请号 JP19990165872 申请日期 1999.06.11
申请人 HITACHI LTD 发明人 NISHIMURA NORIMASA;SHIMASE AKIRA;WATANABE MASAHIRO;KUNI TOMOHIRO;NINOMIYA HIROSHI;MIYAI YASUSHI
分类号 H01J37/20;H01J37/02;H01J37/22;H01J37/24;H01J37/28;(IPC1-7):H01J37/20 主分类号 H01J37/20
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