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发明名称
METHOD AND SYSTEM FOR CONTEXT-SPECIFIC MASK WRITING
摘要
A method for generating lithography marks includes generating integrated circuit design data and using context information from the integrated circuit design data to write a mask.
申请公布号
EP1543451(A2)
申请公布日期
2005.06.22
申请号
EP20030764634
申请日期
2003.07.14
申请人
CADENCE DESIGN SYSTEMS, INC.
发明人
PACK, ROBERT, C.;SHEFFER, LOUIS, K.
分类号
G03F;G03F1/00;G03F1/36;G03F1/78;G03F7/20;G03F9/00;G06F17/50;H01L21/027
主分类号
G03F
代理机构
代理人
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