APPARATUS FOR CLEANING A CHAMBER FOR FABRICATING SEMICONDUCTOR DEVICE AND METHOD OF CLEANING THE SAME

摘要

An apparatus of cleaning a chamber for fabricating a semiconductor device and a method of cleaning the same are provided to reduce an error rate in a manufacturing process by removing residual by-products in an inside of a chamber. A first plasma supply unit supplies first plasma to an inside of a chamber(102) in order to remove a first product(20) attached on an inner wall of the chamber. A second plasma supply unit supplies second plasma to the inside of the chamber in order to remove a second product(30). An upper electrode(110) and a lower electrode(120) are installed in the inside of the chamber. The first plasma and the second plasma are generated in the inside of the chamber by using the upper electrode and the lower electrode. An analysis unit(150) analyzes components of the first and second plasma. A control unit(160) is connected to the first and second plasma supply units in order to control the first and second plasma supply units according to an analyzed result of the analysis unit.