发明名称 Test Cells for semiconductor yield improvement
摘要 A test cell for localizing defects includes a first active region, a second active region formed substantially parallel to the first active region, a third active region formed substantially parallel to the first and second active regions, a fourth active region formed between the first and second active regions, and a fifth active region formed between the second and third active regions. The fourth and fifth active regions are formed adjacent to opposite end portions of the second active region. The fourth and fifth active regions are also formed substantially perpendicular to the second active region.
申请公布号 US2008169466(A1) 申请公布日期 2008.07.17
申请号 US20070002094 申请日期 2007.12.14
申请人 PDF SOLUTIONS, INC. 发明人 STINE BRIAN;KITCH VICTOR;ZWALD MARK;TONELLO STEFANO
分类号 H01L21/66;H01L21/50;H01L23/58 主分类号 H01L21/66
代理机构 代理人
主权项
地址