发明名称 METHOD FOR SIMULATING DEPOSITION FILM SHAPE AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
摘要 A deposition film shape simulation method for calculating a thickness of a thin-film formed by supplying deposition species on a substrate surface, includes: changing a parameter to be used in the calculation depending on the thickness of the deposited thin-film.
申请公布号 US2008220546(A1) 申请公布日期 2008.09.11
申请号 US20070859152 申请日期 2007.09.21
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KINOSHITA SHIGERU
分类号 H01L21/66 主分类号 H01L21/66
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