发明名称 |
Evaporation Donor Substrate and Method for Manufacturing Light-Emitting Device |
摘要 |
To provide an evaporation donor substrate which is used for deposition by an evaporation method and which allows reduction in manufacturing cost and high uniformity of a film which is deposited. In addition, to provide a method for manufacturing a light-emitting device using the evaporation donor substrate. The evaporation donor substrate includes a reflective layer having an opening which is formed over a substrate, a heat insulating layer having a light-transmitting property which is formed over the substrate and the reflective layer, a light absorption layer which is formed over the heat insulating layer; and a material layer which is formed over the light absorption layer.
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申请公布号 |
US2009104403(A1) |
申请公布日期 |
2009.04.23 |
申请号 |
US20080254944 |
申请日期 |
2008.10.21 |
申请人 |
SEMICONDUCTROR ENERGY LABORATORY CO., LTD. |
发明人 |
AOYAMA TOMOYA;SATO YOSUKE;YOKOYAMA KOHEI;TAKAHASHI RENA |
分类号 |
B32B3/24;B05D5/06;C23C16/48 |
主分类号 |
B32B3/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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