ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS

摘要

PURPOSE: A lighting system and a lithography apparatus are provided to control the spacious intensity distribution of a beam by including a controller and to improve uniformity of the beam. CONSTITUTION: A lighting system(IL) comprises an array(15) and a controller(CT1) of an optical element which is individually controllable. The array of the optical element moves between orientations which is able to be selected in order to form a lighting mode in which the optical element is required. The controller controls orientation of one or more optical elements which is individually controllable. The controller is composed in order to add power which partly recompenses power added to one and more elements by the curst of radiation which is income in one or more elements.