| 摘要 |
PROBLEM TO BE SOLVED: To provide an arc plasma film deposition apparatus that attains a high operation rate and facilitates a maintenance operation to remove a carbon film and carbon powder deposited in the apparatus.SOLUTION: An arc plasma film deposition apparatus which generates arc plasma including carbon ions so as to form a thin film consisting principally of carbon on a substrate to be processed includes: a storage chamber in which the substrate is stored; a discharge chamber in which a carbon target for film deposition is arranged; a bent pipe which connects the storage chamber to the discharge chamber and has a bent part; and a plasma generation part which generates plasma for carbon ashing in one of the storage chamber and bent pipe, a carbon film and carbon powder deposited in the storage chamber and bent pipe being removed with the plasma for carbon ashing. |
