发明名称 |
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD |
摘要 |
An illumination optical system for illuminating an irradiated plane (M) with illumination light provided from a light source (1) includes a spatial light modulator (S1), which is arranged in an optical path of the illumination optical system and forms a desired light intensity distribution at a pupil position of the illumination optical system or a position optically conjugated with the pupil position, and a diffuser (4), which is arranged at an incidence side of the spatial light modulator through which the illumination light enters. |
申请公布号 |
WO2009050976(A1) |
申请公布日期 |
2009.04.23 |
申请号 |
WO2008JP66930 |
申请日期 |
2008.09.12 |
申请人 |
NIKON CORPORATION;TANAKA, HIROHISA |
发明人 |
TANAKA, HIROHISA |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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