发明名称 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 An illumination optical system for illuminating an irradiated plane (M) with illumination light provided from a light source (1) includes a spatial light modulator (S1), which is arranged in an optical path of the illumination optical system and forms a desired light intensity distribution at a pupil position of the illumination optical system or a position optically conjugated with the pupil position, and a diffuser (4), which is arranged at an incidence side of the spatial light modulator through which the illumination light enters.
申请公布号 WO2009050976(A1) 申请公布日期 2009.04.23
申请号 WO2008JP66930 申请日期 2008.09.12
申请人 NIKON CORPORATION;TANAKA, HIROHISA 发明人 TANAKA, HIROHISA
分类号 G03F7/20 主分类号 G03F7/20
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