METHOD FOR MANUFACTURING MASTER MOLD, MASTER MOLD MANUFACTURED THEREBY, METHOD FOR MANUFACTURING TRANSPARENT PHOTOMASK, TRANSPARENT PHOTOMASK MANUFACTURED THEREBY, AND METHOD FOR FORMING CONDUCTIVE MESH PATTERN USING TRANSPARENT PHOTOMASK

摘要

The present invention relates to a method for manufacturing a master mold, a master mold manufactured by the method, a method for manufacturing a transparent photomask, a transparent photomask manufactured by the method, and a method for manufacturing a conductive mesh pattern by using the transparent photomask.

主权项

1. A method for manufacturing a master mold, comprising:
a) forming a first photosensitive material layer on a base substrate; b) forming a first photosensitive material pattern layer by making a transparent photomask, in which linear patterns are carved, be in contact with an upper surface of the first photosensitive material layer; c) forming a second photosensitive material layer on the base substrate provided with the first photosensitive material pattern layer; d) making the transparent photomask, in which the linear patterns are carved, be in contact with an upper surface of the second photosensitive material layer, so that the linear pattern of the first photosensitive material pattern layer crosses the linear pattern of the transparent photomask to form a second photosensitive material pattern layer on the base substrate; e) etching portions of the base substrate on which the first photosensitive material pattern layer and the second photosensitive material pattern layer are not formed; and f) removing the first photosensitive material pattern layer and the second photosensitive material pattern layer.