发明名称 SOUND DETECTING MECHANISM AND PROCESS FOR MANUFACTURING THE SAME
摘要 A sound detecting mechanism in which strain of a diaphragm is suppressed while forming the diaphragm to a required thickness. The sound detecting mechanism has a pair of electrodes arranged on a substrate A to form a capacitor, wherein one electrode of the pain of electrodes is a back electrode C having a through hole Ca corresponding to an acoustic hole and the other electrode is a diaphragm B. A silicon nitride film (303) is provided on the base side of the substrate A with reference to a film body as the diaphragm B being formed on the substrate A.
申请公布号 KR20050088208(A) 申请公布日期 2005.09.02
申请号 KR20057011780 申请日期 2005.06.22
申请人 HOSIDEN K.K.;TOKYO ELECTRON LTD. 发明人 OHBAYASHI YOSHIAKI;YASUDA MAMORU;SAEKI SHINICHI;KOMAI MASATSUGU;KAGAWA KENICHI
分类号 H01L29/84;H04R19/00;H04R19/01 主分类号 H01L29/84
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