发明名称 |
TIN OXIDE-BASED SPUTTERING TARGET, LOW RESISTIVITY, TRANSPARENT CONDUCTIVE FILM, METHOD FOR PRODUCING SUCH FILM AND COMPOSITION FOR USE THEREIN |
摘要 |
The present invention is directed to a composition consisting essentially of: a) from about 60 to about 99 mole% of SnO<SUB>2</SUB>, and b) from about 1 to about 40 mole% of one or more materials selected from the group consisting of i) Nb<SUB>2</SUB>O<SUB>5</SUB>, ii) NbO, iii) NbO<SUB>2,</SUB> iv) WO<SUB>2</SUB>, v) a material selected consisting of a) a mixture of MoO<SUB>2</SUB> and Mo and b) Mo, vi) W, vii) Ta<SUB>2</SUB>O<SUB>5</SUB>, and viii) mixtures thereof, wherein the mole %s are based on the totai product and wherein the sum of components a) and b) is 100. The invention is aiso directed to the sintered product of such composition, a sputtering target made from the sintered product and a transparent electroconductive film made from the composition. |
申请公布号 |
WO2008055201(A3) |
申请公布日期 |
2008.07.17 |
申请号 |
WO2007US83160 |
申请日期 |
2007.10.31 |
申请人 |
H. C. STARCK INC.;KUMAR, PRABHAT;WU, RONG-CHEIN, RICHARD;SUN, SHUWEI |
发明人 |
KUMAR, PRABHAT;WU, RONG-CHEIN, RICHARD;SUN, SHUWEI |
分类号 |
C04B35/457;C03C17/245;C23C14/08;C23C14/34 |
主分类号 |
C04B35/457 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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