发明名称 POSITIVE PHOTOSENSITIVE COMPOSITION
摘要 A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a specific basic compound.
申请公布号 US2008318159(A1) 申请公布日期 2008.12.25
申请号 US20080178493 申请日期 2008.07.24
申请人 FUJIFILM CORPORATION 发明人 FUJIMORI TORU
分类号 G03C1/72;G03F7/039;G03F7/004 主分类号 G03C1/72
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