发明名称 |
COMPLETE QUASI-STATIC MODELING METHOD OF RADIO FREQUENCY METAL OXIDE SEMICONDUCTOR FILED EFFECT TRANSISTOR |
摘要 |
A method for simulating an RF(Radio Frequency) MOSFET(Metal Oxide Semiconductor Field Effect Transistor) through RF modeling is provided to offer a complete small-signal model capable of expressing all physical phenomena of the RF MOSFET semiconductor device while being simple and direct in a 20 Ghz band. The complete small-signal model expressing all physical phenomena of the RF MOSFET semiconductor device is suggested. Capacitances(Cjs, Cjd, Rsub) related to a substrate signal coupling network are removed. Turn-on/off of a circuit is precisely controlled by adding Cbs, Cbd, and Cmb. The residual current is easily discharged to earth by adding Rsub having a high resistance value to a body while removing the residual current by adding overlap capacitance(cgse, cgde).
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申请公布号 |
KR20090000249(A) |
申请公布日期 |
2009.01.07 |
申请号 |
KR20070012976 |
申请日期 |
2007.02.08 |
申请人 |
INHA-INDUSTRY PARTNERSHIP INSTITUTE |
发明人 |
SHIN, HYUNG CHEOL;KANG, IN MAN;WON, TAE YOUNG;CHO, SANG YOUNG |
分类号 |
G06F17/00;G06F9/455 |
主分类号 |
G06F17/00 |
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