发明名称 METHOD FOR PRODUCING SINGLE CRYSTAL AND METHOD FOR PRODUCING SILICON WAFER
摘要 Provided is a method for producing a single crystal, comprising: a straight body part formation step for forming the straight body part of a single crystal by bringing a seed crystal into contact with a dopant-added melt in which red phosphorus has been added to a silicon melt so that the resistivity of the single crystal is 0.9 mΩ·cm or lower, and then pulling up the same; and a separating step for separating the single crystal from the dopant-added melt, in a state where the temperature at the top end of the straight body part is 590˚C or higher.
申请公布号 WO2016103748(A1) 申请公布日期 2016.06.30
申请号 WO2015JP60967 申请日期 2015.04.08
申请人 SUMCO CORPORATION 发明人 NARUSHIMA YASUHITO;UTO MASAYUKI;KUBOTA TOSHIMICHI
分类号 C30B15/22;C30B15/04;C30B29/06 主分类号 C30B15/22
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