| 发明名称 |
METHOD AND SYSTEM FOR FORMING A PATTERNED METAL FILM ON A SUBSTRATE |
| 摘要 |
A method and system for forming a thin patterned metal film on a substrate are presented. The method includes applying an ink composition on a pre-treated surface of the substrate, wherein the ink composition includes at least metal cations; and exposing at least the applied ink composition on the substrate to a low-energy plasma, wherein the low-energy plasma is operated according to a first set of exposure parameters. |
| 申请公布号 |
US2016258048(A1) |
申请公布日期 |
2016.09.08 |
| 申请号 |
US201615135094 |
申请日期 |
2016.04.21 |
| 申请人 |
OrelTech Ltd. |
发明人 |
ZAMOSHCHIK Natalia |
| 分类号 |
C23C4/134;C23C4/02 |
主分类号 |
C23C4/134 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for forming a thin patterned metal film on a substrate, comprising:
applying an ink composition on a pre-treated surface of the substrate, wherein the ink composition includes at least metal cations; and exposing at least the applied ink composition on the substrate to a low-energy plasma, wherein the low-energy plasma is operated according to a first set of exposure parameters. |
| 地址 |
Rehovot IL |
