发明名称 |
Encoder, position measurement system and lithographic apparatus. |
摘要 |
An encoder comprises an optical component and an enclosing device having a first surface portion and a second surface portion. The first surface portion is arranged to receive from an ambient environment a first radiation beam. The second surface portion is arranged to receive from the ambient environment a second radiation beam. The optical component is arranged to 5 combine the first radiation beam and the second radiation beam. The enclosing device is arranged to propagate the first radiation beam along a first path. The first path is between the first surface portion and the optical component. The enclosing device is arranged to propagate the second radiation beam along a second path. The second path is between the second surface portion and the optical component. The enclosing device is arranged to enclose a space, so as to 10 isolate the first path and the second path from the ambient environment. |
申请公布号 |
NL2015639(A) |
申请公布日期 |
2016.09.20 |
申请号 |
NL20152015639 |
申请日期 |
2015.10.21 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
WOUTER PRIL;MR. JAN PETER BAARTMAN;SUZANNE COSIJNS;EELCO KOOIKER;BRYAN TONG-MINH |
分类号 |
H01L21/68 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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