| 发明名称 |
Method for Manufacturing Liquid Discharge Apparatus and Liquid Discharge Apparatus |
| 摘要 |
There is provided a method for manufacturing a liquid discharge apparatus including: forming a photoresist film made of a photoresist on a silicon substrate; exposing the photoresist film; forming a nozzle in the photoresist film by exposing the photoresist film and then developing the photoresist film; forming a channel hole in communication with the nozzle by carrying out an etching process from a surface of the substrate on the opposite side from the photoresist film after forming the nozzle; and joining a channel member to the surface of the substrate on the opposite side from the photoresist film, the channel member including a pressure chamber in communication with the channel hole and a piezoelectric element formed as a film to correspond to the pressure chamber. |
| 申请公布号 |
US2016279943(A1) |
申请公布日期 |
2016.09.29 |
| 申请号 |
US201615079192 |
申请日期 |
2016.03.24 |
| 申请人 |
Brother Kogyo Kabushiki Kaisha |
发明人 |
Kakiuchi Toru |
| 分类号 |
B41J2/14;G03F7/32;B41J2/16;G03F7/20 |
主分类号 |
B41J2/14 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for manufacturing a liquid discharge apparatus comprising:
forming a photoresist film made of a photoresist on a silicon substrate; exposing the photoresist film; forming a nozzle in the photoresist film by exposing the photoresist film and then developing the photoresist film; forming a channel hole in communication with the nozzle by carrying out an etching process from a surface of the substrate on the opposite side from the photoresist film after forming the nozzle; and joining a channel member to the surface of the substrate on the opposite side from the photoresist film, the channel member including a pressure chamber in communication with the channel hole and a piezoelectric element formed as a film to correspond to the pressure chamber. |
| 地址 |
Nagoya-shi JP |
