| 摘要 |
An active matrix type liquid crystal display device includes semiconductor layers made of thin film transistors which are formed over a first substrate, a first insulation film formed over the semiconductor layers, a second insulation film formed over the first insulation film, and common lines formed over the second insulation film. The second insulation film includes regions where the film is removed which are positioned where the semiconductor layers are formed. Holding capacitance is formed by a common potential supplied from the common lines in the film-removed regions together with the pixel potential formed by the semiconductor layers. |
