发明名称 |
METHODS AND SYSTEMS FOR TRAPPING ION BEAM PARTICLES AND FOCUSING AN ION BEAM |
摘要 |
A focusing particle trap system for ion implantation removes unwanted particles from an ion beam prior to implantation. An entrance electrode comprising an entrance aperture and is biased to a first base voltage. A center electrode is positioned a distance downstream from the entrance electrode and includes a center aperture. The center electrode is biased to a negative value, less than the first base voltage. An exit electrode is positioned a distance downstream from the center electrode and includes an exit aperture. The exit electrode is biased to a second base voltage. A first electrostatic field is generated from the entrance electrode toward the center electrode and a second electrostatic field is generated from the exit electrode toward the center electrode in order to trap unwanted particles within an ion beam.
|
申请公布号 |
KR20090010067(A) |
申请公布日期 |
2009.01.28 |
申请号 |
KR20087028272 |
申请日期 |
2008.11.19 |
申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
KELLERMAN PETER;BENEVENISTE VICTOR;PEREL ALEXANDER;FREER BRIAN;GRAF MICHAEL |
分类号 |
H01L21/265;H01J37/30 |
主分类号 |
H01L21/265 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|