PASSIVE GAS FLOW MANAGEMENT AND FILTRATION DEVICE FOR USE INAN EXCIMER OR TRANSVERSE DISCHARGE LASER

摘要

The present invention provides systems and methods for filtering particles a nd assisting gas flow management within laser systems. In one embodiment, a las er apparatus (100) includes an elongate laser chamber defining a chamber cavity (130) and an electrode structure (140) disposed therein. The electrode structure includes an anode (148) spaced apart from a cathode (146). The las er includes an elongate baffle (174) disposed in the laser chamber. The baffle is adapted to arrest a plurality of particles generated within the chamber. In this manner, the baffle operates as a passive filtration system to help filt er particles generated within the chamber during laser operation, and may furth er provide gas flow management capabilities.