Micro-structure manufacturing method

摘要

A method of manufacturing a micro-structure includes dry-etching a sacrificial layer provided to a silicon substrate to form structures the sacrificial layer reacting with etching gas to generate reaction products including H₂O, wherein the dry-etching includes etching the sacrificial layer and removing H₂O as one of the reaction products generated through the etching step of the sacrificial layer, wherein the etching and the removing of H₂O are repetitively performed.