发明名称 |
Lithographic Apparatus and Contamination Removal or Prevention Method |
摘要 |
An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
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申请公布号 |
US2009027635(A1) |
申请公布日期 |
2009.01.29 |
申请号 |
US20070862817 |
申请日期 |
2007.09.27 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS;JANSEN HANS;LEENDERS MARTINUS HENDRIKUS;VAN DER NET ANTONIUS JOHANNUS;WANTEN PETER FRANCISCUS;VAN DER DONCK JACQUES COR JOHANNES;WATSO ROBERT DOUGLAS;VAN DEN DOOL TEUNIS CORNELIS;SCHUH NADJA;CROMWIJK JAN WILLEM |
分类号 |
G03B27/42;B08B3/10;B08B9/00;B08B17/00;G03C5/16 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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