发明名称 Photosensitive resin composition, image forming material and image forming method using thereof
摘要 There is devised a novel acryl resin in which an unsaturated group introduced in an alkali soluble resin is placed at a longer distance from the resin skeleton of the alkali soluble resin, the mobility of the unsaturated group is promoted and the number of the unsaturated double bonds is increased; therefore it allows crosslinking reaction to occur easily and a functional resin portion which imparts a specific function, in particular, function of suppressing polymerization inhibition due to oxygen by introduction of an active methylene group is provided at a resin portion existing between the acryl resin skeleton and the unsaturated double bond, and a photosensitive resin composition containing thereof is to be provided. A photosensitive resin composition comprising an alkali soluble resin, an ethylenically unsaturated compound, a near infrared absorbing dye, a compound containing a halomethyl group and a compound containing an organoboron anion, wherein the alkali soluble resin comprises an acryl resin having one or more of pendant groups in which both terminals of a diol compound have been blocked with isophorone diisocyanates and then (meth)acryloyl has been added, and, an image forming material comprising a substrate, and a photosensitive layer formed by the photosensitive resin composition on the substrate, as well as an image forming method.
申请公布号 US2007099115(A1) 申请公布日期 2007.05.03
申请号 US20060589891 申请日期 2006.10.31
申请人 UMEMOTO HIROTOSHI 发明人 UMEMOTO HIROTOSHI
分类号 G03C1/00 主分类号 G03C1/00
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