发明名称 |
Method and system for virtual metrology in semiconductor manufacturing |
摘要 |
Provided are a method and a system for virtual metrology in semiconductor manufacturing. Process data and metrology data are received. Prediction data is generated based on the process data and metrology data using a learning control model. The system for virtual metrology in a fabrication facility comprises a fault detection and classification system operable to receive process data, a statistical process control system operable to perform statistical process control on a history of physical metrology data to form metrology data, and a virtual metrology application operable to generate prediction data based on the process data and the metrology data using a learning control model.
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申请公布号 |
US2007100487(A1) |
申请公布日期 |
2007.05.03 |
申请号 |
US20060378833 |
申请日期 |
2006.03.17 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
CHENG CHANG Y.;FU HSUEH-SHIH;WANG YING-LANG;CHENG FAN-TIEN |
分类号 |
G06F19/00 |
主分类号 |
G06F19/00 |
代理机构 |
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