The invention provides a method for planarizing a metal layer, and a method for manufacturing a micromirror element. The method for planarizing the metal layer, without limitation, may include the steps of forming a metal layer (710) over a photoresist layer (510), and then planarizing the metal layer using a chemical mechanical polishing process.
申请公布号
WO2007035761(A3)
申请公布日期
2009.04.23
申请号
WO2006US36531
申请日期
2006.09.20
申请人
TEXAS INSTRUMENTS INCORPORATED;DICARLO, ANTHONY;CHEN, JINGQIU;HE, YANGHUA;BAKER, JAMES, C.;ROTHENBURY, DAVID, A.
发明人
DICARLO, ANTHONY;CHEN, JINGQIU;HE, YANGHUA;BAKER, JAMES, C.;ROTHENBURY, DAVID, A.