发明名称 NITRIDE SEMICONDUCTOR ELEMENT, NITRIDE SEMICONDUCTOR ELEMENT MOVING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To lessen the impact due to particles remaining on a lateral face of a nitride semiconductor element at the time of dicing.SOLUTION: In a nitride semiconductor element having a sapphire substrate with a c-face serving as a principal surface and a nitride semiconductor part which is formed on the principal surface of the sapphire substrate and includes a single or a plurality of nitride semiconductor layers represented as AlGaInN(x+y+z=v=1, 0≤x≤1, 0≤y≤1, 0≤z≤1), the nitride semiconductor part and the sapphire substrate have two faces (f1, f3) cut on a face parallel with an m-face of the nitride semiconductor layer, and two faces (f2, F4) cut on a face parallel with an a-face of the nitride semiconductor layer as lateral faces.SELECTED DRAWING: Figure 2
申请公布号 JP2016149391(A) 申请公布日期 2016.08.18
申请号 JP20150024083 申请日期 2015.02.10
申请人 ASAHI KASEI CORP 发明人 SATO KOSUKE
分类号 H01L33/32;H01L31/10;H01L33/16 主分类号 H01L33/32
代理机构 代理人
主权项
地址
您可能感兴趣的专利