MASK AND METHOD OF MANUFACTURING PHOTORESIST SPACERS WITH THE MASK

摘要

A mask and a method of manufacturing photoresist spacers with the mask are provided. The method comprises: using the mask to expose and develop to a coated negative resist material, so as to form at least one sub photoresist spacer with at least one predetermined height, wherein an area of the shading portion of the first penetration region is determined according to the predetermined height of the sub photoresist spacer. Using the mask and the method of manufacturing photoresist spacers with the mask, different heights of the sub photoresist spacers can be obtained.

主权项

1. A method of manufacturing photoresist spacers with a mask, wherein the mask comprises at least one first penetration region, and the first penetration region comprises at least one shading portion;
wherein the method of manufacturing photoresist spacers comprises: coating a negative resist material on a surface of a substrate of a liquid crystal display; using the mask to expose the negative resist material; developing the exposed negative resist material to form at least one sub photoresist spacer with at least one predetermined height; wherein an area of the shading portion of the first penetration region is determined according to the predetermined height of the sub photoresist spacer; and the shading portion comprises a first shading portion and a second shading portion of the same area and shape; and wherein the height of the photoresist spacer is in inverse proportion to the area of the shading portion.