发明名称 METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES USING A COMPOSITION FOR REMOVING PHOTORESIST AND METHODS OF REMOVING PHOTORESIST FROM A SEMICONDUCTOR SUBSTRATE
摘要 A composition for removing photoresist, including an alkyl ammonium fluoride salt in an amount ranging from about 0.5 weight percent to about 10 weight percent, based on a total weight of the composition; an organic sulfonic acid in an amount ranging from about 1 weight percent to about 20 weight percent, based on the total weight of the composition; and a lactone-based solvent in an amount ranging from about 70 weight percent to about 98.5 weight percent, based on the total weight of the composition.
申请公布号 US2016315019(A1) 申请公布日期 2016.10.27
申请号 US201615084536 申请日期 2016.03.30
申请人 OH Jung-Min;PARK Mi-Hyun;LEE Hyo-San;JEONG Ji-Hoon;KO Yong-Sun;KIM In-Gi;KIM Na-Rim;KIM Sang-Tae;KIM Seong-Min;LEE Kyong-Ho 发明人 OH Jung-Min;PARK Mi-Hyun;LEE Hyo-San;JEONG Ji-Hoon;KO Yong-Sun;KIM In-Gi;KIM Na-Rim;KIM Sang-Tae;KIM Seong-Min;LEE Kyong-Ho
分类号 H01L21/8238;H01L21/027;H01L21/8234;H01L29/16;H01L21/311;H01L21/02;H01L21/3105;G03F7/42;H01L21/266 主分类号 H01L21/8238
代理机构 代理人
主权项
地址 Incheon KR