发明名称 |
METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES USING A COMPOSITION FOR REMOVING PHOTORESIST AND METHODS OF REMOVING PHOTORESIST FROM A SEMICONDUCTOR SUBSTRATE |
摘要 |
A composition for removing photoresist, including an alkyl ammonium fluoride salt in an amount ranging from about 0.5 weight percent to about 10 weight percent, based on a total weight of the composition; an organic sulfonic acid in an amount ranging from about 1 weight percent to about 20 weight percent, based on the total weight of the composition; and a lactone-based solvent in an amount ranging from about 70 weight percent to about 98.5 weight percent, based on the total weight of the composition. |
申请公布号 |
US2016315019(A1) |
申请公布日期 |
2016.10.27 |
申请号 |
US201615084536 |
申请日期 |
2016.03.30 |
申请人 |
OH Jung-Min;PARK Mi-Hyun;LEE Hyo-San;JEONG Ji-Hoon;KO Yong-Sun;KIM In-Gi;KIM Na-Rim;KIM Sang-Tae;KIM Seong-Min;LEE Kyong-Ho |
发明人 |
OH Jung-Min;PARK Mi-Hyun;LEE Hyo-San;JEONG Ji-Hoon;KO Yong-Sun;KIM In-Gi;KIM Na-Rim;KIM Sang-Tae;KIM Seong-Min;LEE Kyong-Ho |
分类号 |
H01L21/8238;H01L21/027;H01L21/8234;H01L29/16;H01L21/311;H01L21/02;H01L21/3105;G03F7/42;H01L21/266 |
主分类号 |
H01L21/8238 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
Incheon KR |