发明名称 PEELING APPARATUS AND MANUFACTURING APPARATUS OF SEMICONDUCTOR DEVICE
摘要 To eliminate electric discharge when an element formation layer including a semiconductor element is peeled from a substrate used for manufacturing the semiconductor element, a substrate over which an element formation layer and a peeling layer are formed and a film are made to go through a gap between pressurization rollers. The film is attached to the element formation layer between the pressurization rollers, bent along a curved surface of the pressurization roller on a side of the pressurization rollers, and collected. Peeling is generated between the element formation layer and the peeling layer and the element formation layer is transferred to the film. Liquid is sequentially supplied by a nozzle to a gap between the element formation layer and the peeling layer, which is generated by peeling, so that electric charge generated on surfaces of the element formation layer and the peeling layer is diffused by the liquid.
申请公布号 US2016314999(A1) 申请公布日期 2016.10.27
申请号 US201615204091 申请日期 2016.07.07
申请人 Semiconductor Energy Laboratory Co., Ltd. 发明人 EGUCHI Shingo;MONMA Yohei;TANI Atsuhiro;HIROSUE Misako;HASHIMOTO Kenichi;HOSAKA Yasuharu
分类号 H01L21/67;H01L21/683;B32B43/00;H01L27/12 主分类号 H01L21/67
代理机构 代理人
主权项 1. (canceled)
地址 Atsugi-shi JP