Kit for electrically isolating collimator of PVD chamber, chamber so modified, and method of using

摘要

A collimator is mounted within a sputter chamber and is interposed between a sputter target and a wafer to be coated with a thin film of the sputtered material. A shield extends around the perimeter of the volume between the collimator and the wafer. The collimator and shield of the present invention are preferably mounted within the sputter chamber in a manner so that they are electrically insulated from the chamber and able to take on a floating electrical potential associated with the potential of the plasma generated within the sputter chamber. A kit for simply and robustly effecting the mounting of the collimator and shield is disclosed. More uniform deposition and surface planarity of target material on the wafer are achieved with the floating collimator when employed with the floating shield structure.