发明名称 |
AMPLITUDE MASK FOR WRITING LONG-PERIOD GRATINGS |
摘要 |
Long-period gratings are written more quickly and at higher intensities by amplitude masks having shadow-forming patterns that scatter, redirect, or otherwise divert shadow portions of radiation used for writing the gratings instead of blocking the shadow portions by absorption or reflection. The shadow-forming masks can be formed along transparent base optics by arrays of diffusers, diffractors, or refractors that relatively divert different portions of the radiation. |
申请公布号 |
WO0188611(A1) |
申请公布日期 |
2001.11.22 |
申请号 |
WO2001US09954 |
申请日期 |
2001.03.28 |
申请人 |
UNIVERSITY OF ROCHESTER |
发明人 |
ERDOGAN, TURAN;HEANEY, ALAN, D.;STEGALL, DAVID, B. |
分类号 |
G03F1/00;G03F7/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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