发明名称 METHOD FOR FORMING PATTERN USING CRYSTAL STRUCTURE OF MATERIAL AND FUNCTIONAL DEVICE HAVING THE STRUCTURE
摘要 PURPOSE: A method for forming a pattern using a crystal structure of a material and a functional device having the structure are provided to form the pattern of the quantum dots and the quantum lines by using the crystal structure of the material having the uniform size and density and capable of precisely controlling the distribution. CONSTITUTION: The material(13) having the crystal structure processed with a thickness of several tens nm in order to penetrate the electron beam(11) is placed on a chamber. The electron beam is divided into a penetration beam and a diffraction beam by the material having the crystal structure. The penetration beam and the diffraction beam pass through an object lens(15) and an aperture(17) of the object lens and form a lattice image of the material having the crystal structure by interfering with each other in the space. The image formed on an image plane is enlarged by a middle lens(19).
申请公布号 KR20020060380(A) 申请公布日期 2002.07.18
申请号 KR20010001422 申请日期 2001.01.10
申请人 KIM, KI BUM 发明人 KIM, KI BUM
分类号 B82B3/00;G03F1/16;G03F7/20;H01J37/26;H01L21/027;H01L21/263;H01L21/28;H01L21/8247;H01L27/115;H01L29/04;H01L29/06;H01L29/12;H01L29/76;H01L29/78;H01L29/788;H01L29/792;(IPC1-7):H01L21/263 主分类号 B82B3/00
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