发明名称 ELECTROCHEMICAL METHOD FOR ECMP POLISHING PAD CONDITIONING
摘要 A method for conditioning an Ecmp pad is provided. In one embodiment, a method for electrochemically processing a substrate includes the steps of providing an electrical bias voltage between the top surface of the pad assembly and an electrode, and electrochemically removing contaminants from the top surface of the pad.
申请公布号 US2007095677(A1) 申请公布日期 2007.05.03
申请号 US20060554928 申请日期 2006.10.31
申请人 APPLIED MATERIALS, INC. 发明人 WANG YOU;TSAI STAN D.;KARUPPIAH LAKSHMANAN;DIAO JIE;JIA RENHE;YILMAZ ALPAY
分类号 B23H3/00 主分类号 B23H3/00
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